Triacrylamide polyfluorinated chalcone derivative as high resistant light-sensitive material for technology of diffractive optical elements

Triacrylamide polyfluorinated chalcone derivative as high resistant light-sensitive material for technology of diffractive optical elements Full article

Journal

Proceedings of SPIE - The International Society for Optical Engineering
ISSN: 0277-786X , E-ISSN: 1996-756X

Output data

Year: 2019, Volume: 11030, Article number : 110301D, Pages count : DOI: 10.1117/12.2521139

Tags

light-sensitive material; diffractive optical elements; reactive ion etching; liquid etching chalcone derivative; transmission gratings; photopolymer; photoresist

Authors

Derevyashkin Sergey, V ¹ , Soboleva Elena A. ¹ , Shelkovnikov Vladimir V. ¹ , Spesivtsev Evgeny, V ² , Korolkov Victor P. ³ , Malyshev Anatoly, I ³

Affiliations

1	(Данные Web of science) RAS, NN Vorozhtsov Novosibirsk Inst Organ Chem SB, Moscow, Russia
2	(Данные Web of science) RAS, Rzhanov Inst Semicond Phys SB, Moscow, Russia
3	(Данные Web of science) RAS, Inst Automat & Electrometry SB, Moscow, Russia

The manufacturing methods and materials for diffractive optical elements are actively developed due to the prospects of their use in various components of the microsystem technology. Photolithography occupies a central place in modern manufacturing technology for such components. The photoresists used in it can be exposed to high (100-150 degrees) temperatures, treated in a liquid environment, aggressive (alkaline, acidic) fluids, reactive ion etching (RIE), and electrolyte exposed to electrochemical deposition of metals. Therefore, the development of photoresist materials with thermo-, plasma-, chemo-and moisture resistance is relevant and of the high interest at this time. One of the promising classes of organic compounds with photoresistive properties is the chalcones. It is shown that polyfluorochalcones are capable of providing the holographic recording of transmission gratings with diffraction efficiency up to 59% and angular selectivity up to 54.5 degrees. The masking and thermal properties of triacrylamide polyfluorochalcon (TAPCh), its triaryl pyrazoline modification (TAP), as well as modifications by prepolymerized triaryl pyrazoline (polyTAP) under liquid chemical conditions (in H2SO4, H3PO4, NaOH) and reactive ion etching (in plasma CF4) were investigated. A comparison of properties with commercially available photoresists SU-8, AZ4562 was also conducted. It has been shown that TAFH is resistant to liquid etching, which is the same for SU-8, but shows higher results in RIE process; TAFH exceeds the performance of photoresist AZ4562 in resistance to RIE, and significantly exceeds it in liquid (alkaline and acid) etching; thermal stability TAFH exceeds SU-8 and AZ4562.

Derevyashkin S.V. , Soboleva E.A. , Shelkovnikov V.V. , Spesivtsev E.V. , Korolkov V.P. , Malyshev A.I.
Triacrylamide polyfluorinated chalcone derivative as high resistant light-sensitive material for technology of diffractive optical elements
Proceedings of SPIE - The International Society for Optical Engineering. 2019. V.11030. 110301D . DOI: 10.1117/12.2521139 WOS Scopus РИНЦ

Published print:

May 14, 2019

Web of science	WOS:000485115700040
Scopus	2-s2.0-85073908050
Elibrary	41809639
OpenAlex	W2945845925