Volatile trinuclear heterometallic beta-diketonates: Structure and thermal properties related to the chemical vapor deposition of composite thin films Научная публикация
Журнал |
Polyhedron
ISSN: 0277-5387 |
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Вых. Данные | Год: 2020, Том: 191, Номер статьи : 114806, Страниц : DOI: 10.1016/j.poly.2020.114806 | ||||||
Ключевые слова | Beta-diketonates; Composite films; Heterometallic complexes; MOCVD; Single source precursors; Volatile metalorganic complexes | ||||||
Авторы |
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Организации |
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Реферат:
A series of new trinuclear molecular complexes [PbL12{Co(hfa)2}2] (1), [PbL12{Ni(hfa)2}2] (2), [PbL22{Co(hfa)2}2] (3), [PbL22{Ni(hfa)2}2] (4), [PbL32{Co(hfa)2}2] (5), [PbL32{Ni(hfa)2}2] (6), where L = methoxy-substituted β-diketonate RCOCHCOC(CH3)2OCH3, L1: R = CH3, L2: R = CF3, L3: R = C(CH3)3; hfa = hexafluoroacetylacetonate, were synthesized. Crystal structures were determined by single crystal X-ray analysis. Volatility and thermal stability of the obtained compounds were studied by thermal gravimetric analysis, vacuum sublimation and by mass transfer in helium flow. It was established that all the obtained heterometallic complexes are volatile and can be sublimed in vacuum without dissociation into monometallic complexes. Compounds 3–6 were examined as SSP (single source precursors) in conventional low pressure MOCVD (Metalorganic Chemical Vapor Deposition) of inorganic films on Si(1 0 0) substrates. Influence of precursor composition on their structure and thermal properties as well as on the composition of the deposited inorganic films are discussed. © 2020 Elsevier Ltd
Библиографическая ссылка:
Krisyuk V.V.
, Ursym kyzy S.
, Rybalova T.V.
, Korolkov I.V.
, Sysoev S.V.
, Koretskaya T.P.
, Kuchumov B.M.
, Turgambaeva A.E.
Volatile trinuclear heterometallic beta-diketonates: Structure and thermal properties related to the chemical vapor deposition of composite thin films
Polyhedron. 2020. V.191. 114806 . DOI: 10.1016/j.poly.2020.114806 WOS Scopus РИНЦ
Volatile trinuclear heterometallic beta-diketonates: Structure and thermal properties related to the chemical vapor deposition of composite thin films
Polyhedron. 2020. V.191. 114806 . DOI: 10.1016/j.poly.2020.114806 WOS Scopus РИНЦ
Даты:
Опубликована в печати: | 1 нояб. 2020 г. |
Идентификаторы:
Web of science | WOS:000583325200011 |
Scopus | 2-s2.0-85092004063 |
РИНЦ | 45252833 |
OpenAlex | W3088354981 |