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Fabrication of High-Aspect-Ratio Microstructures on Tetraacrylate/Acrylamide Monomers Using Synchrotron Radiation Full article

Journal High Energy Chemistry
ISSN: 0018-1439
Output data Year: 2019, Volume: 53, Number: 2, Pages: 136-142 Pages count : 7 DOI: 10.1134/S0018143919020048
Tags acrylate monomers; acrylamide monomers; polymerization; X-ray lithography; X-ray resist
Authors Derevyanko D.I. 1 , Orlova N.A. 1 , Shelkovnikov V.V. 1,2 , Shundrina I.K. 1 , Goldenberg B.G. 3 , Korolkov V.P. 4
Affiliations
1 (Данные Web of science) Russian Acad Sci, Novosibirsk Inst Organ Chem, Siberian Branch, Novosibirsk 630090, Russia
2 (Данные Web of science) Novosibirsk State Tech Univ, Novosibirsk 630073, Russia
3 (Данные Web of science) Russian Acad Sci, Budker Inst Nucl Phys, Siberian Branch, Novosibirsk 630090, Russia
4 (Данные Web of science) Russian Acad Sci, Siberian Branch, Inst Automat & Elect, Novosibirsk 630090, Russia

Abstract: Photopolymer materials based on new polyacryl monomers of acrylate and mixed acrylate-acrylamide types have been obtained. Crosslinked films based on the synthesized monomers have been prepared by photopolymerization, and the thermomechanical properties of the crosslinked films have been studied. The storage modulus of the photopolymer films were determined at room temperature (1.3 and 1.5 GPa) and the glass transition temperature (82-93 degrees C). High-aspect-ratio microstructures have been written using synchrotron radiation (SR) at the VEPP-3 storage ring (electron energy, 2 GeV) of a LIGA station at the Budker Institute of Nuclear Physics, SB RAS. It has been revealed that a synchrotron radiation dose of 1-15 J/cm(3) results in polymerization of the monomers. The dependence of the thickness of a given microstructure on the absorbed SR dose has been found, and the corresponding characteristic curve has been constructed. Microstructures with an aspect ratio of 1 : 25 have been obtained.
Cite: Derevyanko D.I. , Orlova N.A. , Shelkovnikov V.V. , Shundrina I.K. , Goldenberg B.G. , Korolkov V.P.
Fabrication of High-Aspect-Ratio Microstructures on Tetraacrylate/Acrylamide Monomers Using Synchrotron Radiation
High Energy Chemistry. 2019. V.53. N2. P.136-142. DOI: 10.1134/S0018143919020048 WOS Scopus РИНЦ
ArticleLinkType.TRANSLATED_TO_ORIGINAL: Деревянко Д.И. , Орлова Н.А. , Шелковников В.В. , Шундрина И.К. , Гольденберг Б.Г. , Корольков В.П.
Формирование высокоаспектных микроструктур на тетраакрилат/акриламидных мономерах под действием синхротронного излучения
Химия высоких энергий (HIGH ENERG CHEM+ ). 2019. Т.53. №2. С.127-134. DOI: 10.1134/S0023119319020049 РИНЦ
Dates:
Published print: Mar 1, 2019
Published online: May 24, 2019
Identifiers:
Web of science WOS:000469020800007
Scopus 2-s2.0-85066323752
Elibrary 41645139
OpenAlex W2946741416
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